JOURNAL ARTICLE

Deposition and morphology of direct current plasma-polymerized aniline.

  • Published In: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics, 2023, v. 41, n. 3. P. 1 1 of 3

  • Database: Applied Science & Technology Source Ultimate 2 of 3

  • Authored By: Palardonio, Sidney M.; Vasquez Jr., Magdaleno R. 3 of 3

Abstract

This article focuses on the plasma polymerization of aniline using a direct current (DC) glow discharge to deposit plasma-polymerized aniline (PPAni) thin films on indium-doped tin oxide (ITO)/glass substrates. The study demonstrates that the plasma species remain consistent during polymerization, with their concentrations varying over time but not significantly with discharge voltage. The resulting PPAni films exhibit smooth, pinhole-free morphology, with film thickness linearly dependent on deposition duration and deposition rate increasing with discharge voltage. Spectroscopic analyses indicate the films are primarily in the leucoemeraldine form, showing evidence of molecular fragmentation and ring rupture at higher discharge voltages and longer deposition times.

Additional Information

  • Source:Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics. 2023/05, Vol. 41, Issue 3, p1
  • Document Type:Article
  • Subject Area:Chemistry
  • Publication Date:2023
  • ISSN:21662746
  • DOI:10.1116/6.0002497
  • Accession Number:163823196
  • Copyright Statement:Copyright of Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics is the property of American Institute of Physics and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)

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