JOURNAL ARTICLE
The Extent to Which Technostress Is Related to Employees' Work-Life Fit: A Multilevel Meta-Analysis.
Published In: Workplace Health & Safety, 2024, v. 72, n. 10. P. 421 1 of 3
Database: CINAHL Ultimate 2 of 3
Authored By: Bottaro, Rossella; De Giovanni, Katya; Faraci, Palmira 3 of 3
Abstract
This article presents a multilevel meta-analytic review examining the association between technostress—stress related to the use of Information and Communication Technologies (ICT)—and work-life fit (WLF), defined as the degree to which employees effectively balance work and personal life demands. Analyzing seven eligible studies with a total of 1,923 adult participants, the review found a statistically significant moderate negative correlation (Cohen’s d = −0.41), indicating that higher technostress is associated with lower WLF. The findings highlight that while ICT use can blur boundaries between work and personal life, it also holds potential as a resource if managed properly. The review underscores the need for further longitudinal research and consideration of demographic and cultural factors to better inform organizational policies aimed at promoting employee well-being in the digital era.
Additional Information
- Source:Workplace Health & Safety. 2024/10, Vol. 72, Issue 10, p421
- Document Type:Journal Article
- Subject Area:Information Technology
- Publication Date:2024
- ISSN:2165-0799
- DOI:10.1177/21650799241264317
- Accession Number:179974558
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